Controlling depth of annealing
The depth of annealing is controlled by measuring the height of the silicon substrate using the CD5 Series laser displacement sensor. The specular reflection type CD5-L25A can measure the height with a repeat accuracy of 0.37 μm, enabling accurate measurement of the annealing depth and precise control.
Products Used
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High-performance Multi-unit Laser Displacement Sensors
CD5 Series
Next level integration of accuracy, stability, and operability
Application Examples for Semiconductor
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